High Purity Alumina Ceramic Gas Distribution Plate for PVD / PECVD Chambers

We supply high purity alumina ceramic gas distribution plates in typical diameters from 100 mm to 450 mm with thicknesses from 6 mm to 25 mm, and we can manufacture fully custom plates according to CAD drawings, including special outer shapes, mounting features and multi-zone gas distribution patterns.

Catalogue No. AT-HP-FP01
Material Al₂O₃
Purity  99%-99.99%
Density of sintered high purity alumina ~3.9 g/cm³
Maximum recommended use temperature of alumina body 1500–1650 °C
24H Standard Dispatch
Small Batch Support OEM
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A high purity alumina gas distribution plate is a dense ceramic plate made from high purity alumina (typically ≥99.5% Al₂O₃) that sits in a PVD, PECVD or ALD chamber and meters process gases into the reactor through a large number of precisely machined micro-holes.

High Purity Alumina Gas Distribution Plate Benefits

  • Optimised micro-hole layout for film thickness uniformity
    The micro-hole diameter, pattern and zone density on the High Purity Alumina Gas Distribution Plate are designed to keep gas velocity and composition uniform above the substrate, supporting tight film thickness uniformity and stable coating conditions in modern PVD and PECVD tools.

  • High purity alumina body for reactive plasma environments
    The plate uses high purity alumina, which offers good resistance to fluorine- and chlorine-containing process gases, helping maintain dimensional stability and surface integrity over long coating campaigns.

  • Dense, vacuum-tight structure for clean operation
    Dense high purity alumina is essentially non-porous and vacuum-tight, with high compressive and flexural strength, which reduces gas back-diffusion and limits particle generation compared with more porous ceramics or unprotected metal plates.

  • Electrical insulation compatible with RF and plasma systems
    High purity alumina provides high dielectric strength and low dielectric loss at typical RF frequencies, allowing the gas distribution plate to function as an electrically insulating component in RF-driven plasma reactors or chambers with integrated electrodes.

  • Upgradable with ALD barrier coatings for extended life
    When additional plasma erosion resistance is required, the alumina body can be combined with ALD ceramic barrier coatings that reduce surface erosion rate and extend the service lifetime of the gas distribution plate in aggressive chemistries.

 

High Purity Alumina Gas Distribution Plate Properties

Property Unit 99.5% Al₂O₃ 99.6% Al₂O₃ 99.7% Al₂O₃ 99.8% Al₂O₃ 99.9% Al₂O₃ 99.99% Al₂O₃
Alumina content % 99.5 99.6 99.7 99.8 99.9 99.99
Density g/cm³ 3.89 3.91 3.92 3.93 3.94 3.98
Open porosity % 0
Color Ivory Ivory Ivory Ivory Ivory Ivory
Water absorption % 0 0 0 0 0
Young’s modulus (Elastic modulus) GPa 375 356 357 358 359 362
Shear modulus GPa 152
Bulk modulus GPa 228
Poisson’s ratio 0.22
Compressive strength MPa 2600 2552 2554 2556 2558 2570
Flexural strength MPa 379 312 313 314 315 320
Fracture toughness MPa·m¹ᐟ² 4
Hardness GPa 14.1 (≈1440 kg/mm²) 23 24 25 26 30
Thermal conductivity W/m·K 35 32–37 33–38 34–39 35–40 36–42
Thermal shock resistance ΔT °C 222 223 224 225 228
Maximum use temperature (no load) °C ≤1750 1755 1760 1765 1770 1800
Coefficient of thermal expansion 10⁻⁶/°C 8.4
Specific heat J/kg·K 880
Volume resistivity Ω·cm >1×10¹⁴ >1×10¹⁴ >1×10¹⁴ >1×10¹⁴ >1×10¹⁴ >1×10¹⁴
Dielectric constant (relative permittivity) 9.8 9.83 9.84 9.85 9.86 9.92
Dielectric strength kV/mm 16.9 23.2 23.4 23.6 23.8 24
Dissipation factor (loss factor @ 1 kHz) 0.0002

 

High Purity Alumina Ceramic Gas Distribution Plate Specification

High Purity Alumina Gas Distribution Plate
Item No. Diameter (mm) Thickness (mm)
AT-HP-FP01 Customize

 

High Purity Alumina Ceramic Gas Distribution Plate Packaging

  • Each High Purity Alumina Ceramic Gas Distribution Plate is placed in a dedicated foam or molded cushioning tray to prevent edge chipping during transport.
  • The tray is sealed in a clean PE or antistatic bag with desiccant where needed, then loaded into a double-wall export carton or plywood case with corner protection.

High Purity Alumina Ceramic Gas Distribution Plate Packaging

Application Scenarios — High Purity Alumina Gas Distribution Plate

  • PVD Hard Coating Systems for Cutting Tools and Moulds

    ✅Key Advantages

    1. Controlled gas profile over rotating fixtures — The micro-hole pattern keeps gas velocity and composition consistent around rotating tool carriers, supporting tight film-thickness and hardness uniformity.

    2. Stable performance in metal and nitride coatings — The high purity alumina body resists erosion from metal vapours and reactive gases used in TiN, TiAlN, CrN and similar coating recipes.

    3. Rigid large-diameter plate geometry — High mechanical strength allows thin plates in larger diameters, limiting deflection and helping maintain a constant target–substrate spacing.

    ✅ Problem Solved

    Tool coating plants aim to keep coating batches within a narrow hardness and colour window while minimising unplanned stops. A High Purity Alumina Ceramic Gas Distribution Plate with a tailored hole layout helps maintain uniform gas and plasma conditions above dense tool loads, reducing edge effects and local over-coating. Its stiffness and chemical stability support long coating campaigns between scheduled maintenance, which lowers cleaning frequency, stabilises cycle time and protects overall line throughput.

  • Decorative PVD Lines for Architectural Hardware and Consumer Parts

    ✅Key Advantages

    1. Uniform appearance across large fixture areas — Even gas distribution over complex 3D racks helps control colour tone and gloss for visible hardware and trim parts.

    2. Custom outline for retrofit projects — The plate can be machined to match existing metal showerhead footprints, bolt patterns and sealing lands in older chambers.

    3. Extended service interval in mixed-gas processes — The alumina surface and optional barrier coatings slow down corrosion and build-up in reactive decorative processes that combine inert gases with metal and reactive gases.

    ✅ Problem Solved

    Architectural and consumer hardware producers are sensitive to visible colour shift and surface defects between batches. A High Purity Alumina Ceramic Gas Distribution Plate supports stable gas delivery during long decorative runs, which improves batch-to-batch visual consistency and reduces the share of re-work parts. At the same time, its resistance to process chemistry helps coating lines keep showerhead replacements aligned with planned maintenance windows instead of reacting to corrosion-related failures.

  • PECVD / ALD Systems for Glass, Display and Functional Films

    ✅Key Advantages

    1. Large-area gas diffusion capability — The plate can be scaled to large rectangular or circular formats while maintaining controlled hole density for wide glass or panel substrates.

    2. Flexible multi-zone gas control — Separate inner, middle and outer gas zones can be designed into one plate to tune radial or segment-wise gas flow for demanding uniformity specifications.

    3. Compatibility with barrier and passivation coatings — The alumina base can be combined with thin ceramic barrier layers to support moisture-sensitive or corrosive ALD and PECVD chemistries.

    ✅ Problem Solved

    R&D teams and pilot lines for glass, display and functional films often need to scale recipes from small wafers to wide substrates while keeping sheet-resistance, refractive index or transmission within a tight tolerance across the panel. A High Purity Alumina Ceramic Gas Distribution Plate designed with multiple gas zones and a carefully graded hole pattern helps shape the flow field over the entire substrate width. This improves process transfer from lab chambers to pilot tools, shortens tuning time for new products and reduces the number of non-conforming panels during scale-up.

High Purity Alumina Gas Distribution Plate Use Guide

  • Installation

    1. Inspect before installation
    Check the High Purity Alumina Ceramic Gas Distribution Plate for chips, cracks or contamination under good lighting. Do not install a plate with visible damage.

    2. Verify fit and orientation
    Confirm that outer diameter, bolt-circle, alignment holes, gas ports and sealing surfaces match the chamber drawing. Mark the “gas manifold side” and “process side” if not already identified.

    3. Handle with appropriate tools
    Lift the plate with clean gloves and padded supports. Avoid gripping thin edges with metal tools. When possible, use lifting holes or dedicated carriers instead of holding the plate by hand.

    4. Mount with controlled torque
    Place the plate on the support surface evenly, then tighten fasteners in a cross pattern with a calibrated torque wrench. Increase torque in several steps to avoid bending the ceramic.

    5. Check seals and clearances
    Inspect O-rings or metal gaskets for correct seating. Ensure no seal material intrudes into gas ports and that there is adequate clearance between the plate and nearby shields or fixtures.

  • Operation

    1. Follow chamber process limits
    Operate within the specified ranges for pressure, temperature, gas type and RF power defined by the chamber design. Avoid sudden changes in temperature or pressure that could shock the ceramic.

    2. Ramp process conditions gradually
    When starting a new recipe, ramp gas flow, pressure and power in controlled steps while monitoring plasma distribution and film uniformity to confirm that the gas distribution plate behaves as expected.

    3. Avoid direct mechanical impact
    Do not hit the plate with tools or fixtures when loading targets, shields or substrates. Ensure rotating fixturing and moving shutters cannot contact the plate during operation.

    4. Monitor for process drift
    Track film thickness uniformity and plasma symmetry over time. Changes in these indicators can point to partial hole blockage, contamination or erosion on the gas distribution plate.

  • Storage

    1. Keep in original protective packaging
    Store spare plates in their foam inserts or molded trays. If original packaging is unavailable, use soft, rigid supports that protect both faces and edges.

    2. Store individually and upright where possible
    Avoid stacking plates directly. If multiple plates share a container, separate them with rigid dividers and vibration-damping material.

    3. Control environment
    Keep plates in a clean, dry, temperature-stable storage area away from vibration and corrosive chemicals. Label each package with part number, revision and chamber type for easy identification.

  • Cleaning and Maintenance

    1. Use compatible cleaning agents
    Apply only cleaning chemistries verified as suitable for high purity alumina and any additional coatings on the plate. Avoid agents that aggressively attack ceramics, seals or coatings.

    2. Clean gently but thoroughly
    Remove loose particles with filtered air or nitrogen at moderate pressure. For deposits, use soft brushes, non-metallic scrapers and clean wipes rather than abrasive pads or sharp tools.

    3. Rinse and dry properly
    After wet cleaning, rinse with high-purity water or solvent recommended by the process engineer. Dry the plate completely with filtered air or in a clean oven at moderate temperature.

    4. Inspect hole pattern
    Periodically examine representative areas of the micro-hole pattern. If deposits or partial blockage are visible, schedule cleaning or refurbishment before they affect film uniformity.

    5. Document maintenance intervals
    Record installation date, process hours and cleaning cycles for each plate. Use these records to establish predictive replacement or refurbishment intervals based on your process conditions.

High Purity Alumina Ceramic Gas Distribution Plate FAQ

  1. Q: What is a High Purity Alumina Ceramic Gas Distribution Plate used for?
    A: It meters and spreads process gases through precision micro-holes to create a uniform gas and plasma environment above the substrate in PVD, PECVD or ALD chambers.
  2. Q: What alumina purity is typically used for this gas distribution plate?
    A: Most plates use dense high purity alumina in the 99.5–99.8% range to combine mechanical strength with good chemical stability.
  3. Q: How does the gas distribution plate influence film thickness uniformity?
    A: Hole diameter, spacing and zoning control local gas flow and plasma density, which directly affect within-substrate and batch-to-batch thickness uniformity.
  4. Q: Can a High Purity Alumina Gas Distribution Plate be customised to our chamber design?
    A: Yes, outer shape, thickness, hole pattern, gas zones, mounting and sealing details can be produced according to chamber drawings or 3D models.
  5. Q: What are the main advantages compared with a metallic showerhead?
    A: It provides electrical insulation, higher corrosion resistance in many chemistries and a dense, vacuum-tight structure that helps limit contamination.
  6. Q: What information is needed to request a quotation for a custom plate?
    A: Typically a dimensioned drawing or 3D file, material grade, hole size and pattern, gas zones, surface finish requirements and expected process conditions.

High Purity Alumina Gas Distribution Plate Reviews

  • ⭐️⭐️⭐️⭐️⭐️
    We introduced high purity alumina ceramic gas distribution plates into a retrofit PECVD tool and saw more stable film uniformity over several campaigns. ADCERAX supported our drawing changes efficiently.
    -- Mark J., Process Engineering Manager, ToolCoat Systems GmbH (Germany)
  • ⭐️⭐️⭐️⭐️⭐️
    For our decorative PVD lines we needed a supplier who could handle custom hole patterns and small batch orders. The High Purity Alumina Ceramic Gas Distribution Plate from ADCERAX matched our chamber interfaces and arrived within the agreed lead time.
    -- Laura S., Purchasing Supervisor, SurfaceTech Coating Services (USA)
  • ⭐️⭐️⭐️⭐️⭐️
    We use custom alumina gas distribution plates for pilot PECVD reactors. Being able to adjust plate thickness and gas zoning with ADCERAX engineering support helped us tune plasma profiles during process development.
    -- Kenji T., R&D Engineer, ThinFilm Lab Solutions Inc. (Mexico)
  • ⭐️⭐️⭐️⭐️⭐️
    After switching to alumina ceramic gas distribution plates we reduced unplanned maintenance related to showerhead corrosion. The combination of material choice and consistent machining quality provides a good balance between performance and cost.
    -- Paolo R., Operations Director, EuroCoat Hardware Finishing S.r.l. (Italy)
customize size

Custom High Purity Alumina Ceramic Gas Distribution Plate

We provide custom High Purity Alumina Ceramic Gas Distribution Plates tailored to each chamber design, covering size, gas zoning and interface details so that the plate integrates directly into existing PVD, PECVD or ALD hardware.

  • Outer diameter, rectangular size or special outline profiles, including chamfers, bevels and step shoulders

  • Plate thickness, flatness across the full face and parallelism between the gas side and the chamber side

  • Hole diameter range (for example 0.2–2.0 mm), pitch, pattern geometry (radial, concentric, matrix) and total hole count

  • Separate gas zones (inner/middle/outer rings or sectors) with different hole diameters, densities or gas inlets

  • Alignment and mounting features such as dowel pin holes, keyways, slots, threaded holes and bolt-circle patterns

  • Counterbores, recessed pockets, sealing lands and O-ring grooves facing the gas manifold or chamber wall

  • Surface finish on each side: as-fired, ground, lapped or locally polished around sealing and plasma-facing areas

  • Edge details including radius, chamfer, protective land width and break-corner specification to reduce chipping

  • Material grade: standard high purity alumina, ultra-high-purity alumina or matched material sets for multi-part assemblies

  • Optional ALD or CVD protective coatings on gas-facing surfaces and hole walls, compatible with defined process chemistries

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